News from the Society

Sarah Michaud

Publications

Thank you, editors

We are happy to announce that the following individuals were recently appointed as new editors for the following journals: Applied Optics: Bo Dong, Institute for Infocomm Research (I2R), Singapore; Libo Yuan, Harbin Engineering University, China. Optica: Giulio Cerullo, Politecnico di Milano, Italy; Christophe Dorrer, University of Rochester, USA; Guifang Li, CREOL, University of Central Florida, USA; Nathalie Picqué, Max Planck Institute of Quantum Optics, Germany. Optics Express: Xiang Liu, Futurewei Technologies, USA; Alexander Lvovsky, University of Calgary, Canada; Thomas Murphy, University of Maryland, College Park, USA; Benyuan Zhu, OFS Laboratories, USA. Optics Letters: Wiendelt Steenbergen, University of Twente, the Netherlands; Edward Whittaker, Stevens Institute of Technology, USA.

We would like to thank the following editors, who have recently finished their terms, for their years of service: Applied Optics: Augusto Garcia-Valenzuela, University Nacional Autónoma de México. Optics Express: Guifang Li, CREOL, University of Central Florida, USA; F. Javier Garcia de Abajo, ICFO-The Institute of Photonic Sciences, Spain; Colin McKinstrie, Applied Communication Sciences, USA; Roland Winston, University of California Merced, USA. Optics Letters: Brian Justus, U.S. Naval Research Laboratory.

Publications

Thank you, editors

We are happy to announce that the following individuals were recently appointed as new editors for the following journals: Applied Optics: Bo Dong, Institute for Infocomm Research (I2R), Singapore; Libo Yuan, Harbin Engineering University, China. Optica: Giulio Cerullo, Politecnico di Milano, Italy; Christophe Dorrer, University of Rochester, USA; Guifang Li, CREOL, University of Central Florida, USA; Nathalie Picqué, Max Planck Institute of Quantum Optics, Germany. Optics Express: Xiang Liu, Futurewei Technologies, USA; Alexander Lvovsky, University of Calgary, Canada; Thomas Murphy, University of Maryland, College Park, USA; Benyuan Zhu, OFS Laboratories, USA. Optics Letters: Wiendelt Steenbergen, University of Twente, the Netherlands; Edward Whittaker, Stevens Institute of Technology, USA.

We would like to thank the following editors, who have recently finished their terms, for their years of service: Applied Optics: Augusto Garcia-Valenzuela, University Nacional Autónoma de México. Optics Express: Guifang Li, CREOL, University of Central Florida, USA; F. Javier Garcia de Abajo, ICFO-The Institute of Photonic Sciences, Spain; Colin McKinstrie, Applied Communication Sciences, USA; Roland Winston, University of California Merced, USA. Optics Letters: Brian Justus, U.S. Naval Research Laboratory.

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