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Metamaterials Enable Sub-Diffraction Imaging

Yvonne Carts-Powell

Optical superlenses made with negative-refractive materials could allow much finer optical lithography and chip inspection.

Scatterings imageOptical lithography with plasmonic lenses.

Optical superlenses made with negative-refractive materials could allow much finer optical lithography and chip inspection. Xiang Zhang of the University of California at Berkeley discussed this and other potential applications of superlenses during his invited talk at the second European Topical Meeting on Nanophotonics and Metamaterials in Seefeld, Austria, in January.

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Publish Date: 01 February 2009


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