Scatterings
Bringing Extreme UV Microscopy to the Tabletop
A U.S. research team has demonstrated a reflection microscope with a tabletop-sized laser for illumination.
Courtney Brewer (left) and Fernando Brizuela examine images obtained with the EUVL microscope. The microscope chamber can be seen in the back.
Semiconductor manufacturers envision using extreme ultraviolet lithography (EUVL) to achieve the next level of integrated-circuit miniaturization. For the necessary EUVL mask inspection, a U.S. research team has demonstrated a reflection microscope with a tabletop-sized laser for illumination (Opt. Lett. 34, 271).
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