Multilayer Mirrors for X-rays and the Extreme UV

James H. Underwood

Multilayer reflectors for the x-ray and extreme ultraviolet spectral regions—together called the XUV region, and stretching from a few angstroms to about 300 Å—have recently become a practical reality. This is partly a result of advances in vacuum deposition and surface preparation technologies, and partly because of the recent resurgence of interest in optics for this region of the spectrum. In turn, this interest stems from the development of new and intense sources of XUV such as synchrotron radiation and plasma sources, and the realization of the scientific opportunities offered by this region of the spectrum, from x-ray microscopy to x-ray astronomy.

Log in or become a member to view the full text of this article.


This article may be available for purchase via the search at Optica Publishing Group.
Optica Members get the full text of Optics & Photonics News, plus a variety of other member benefits.

Add a Comment